Intuitive products, capable processes, world-class service

CORIAL is driving innovation in plasma etching and deposition technologies for specialty semiconductor markets

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Introducing the new CORIAL website

Find all the information you need about the markets we serve and how our plasma processing solutions can work for you

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Enjoy exceptional process flexibility

Corial 210IL offers the capability to etch in RIE, ICP, ALE & DRIE mode in the same reactor

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Our know-how

Built on more than 30 years of combined experience and expertise, CORIAL is the technology leader driving innovation in plasma etch and deposition equipment for specialty semiconductor markets.

Advanced Equipment

We invest 15% of our revenues in R&D, in order to provide the most versatile, reliable, and highest-performing etch and deposition systems for specialty semiconductor markets.

We deliver the only control software that broadens the process capabilities of conventional ICP tools to enable time-multiplexed processes such as the Bosch process, and Atomic Layer Etching (ALE).

Team Expertise

Our engineers combine a thorough knowledge of plasma physics and chemistry with rigorous experimental design techniques (D.O.E.) to develop our products and processes.

That technical expertise plus our distribution network enables CORIAL to offer a highly flexible suite of products with low cost of ownership.

Extensive Process Library

At CORIAL, we address a range of end-market applications including MEMS, optoelectronics, failure analysis, power devices, advanced packaging, wireless devices and integrated optics.

Our R&D team continuously develops and fine-tunes the etching and deposition processes that will enable our customers to structure the materials of today and tomorrow.

CORIAL in brief

years of customer support

in research institutes, universities,

and fabs

specialty semiconductor markets

served by our process solutions

different wafer processing

technologies