Plasma technologies

Push the limits of material processing with CORIAL’s plasma-based technologies that enable the manufacture of next generation devices for specialty semiconductor markets. RIE Simple-to-operate equipment for etching a wide range of materials with moderate etch...

Atomic Layer Deposition (ALD)

Highly conformal coating for MEMS, nanotechnology applications, and semiconductor devices ALD technology Atomic Layer Deposition (ALD), used to deposit films on a monolayer scale, has become widely adopted in R&D and various industries. The ALD mechanism proceeds...

Atomic Layer Etching (ALE)

The promising technology to address the challenges of manufacturing next-gen micro devices Conventional (i.e., continuous) etch processes no longer deliver the required level of control, as CDs approach the sub-10 nanometer scale. To continue technology scaling in...

Atomic Layer Processing (ALP)

Atomic Layer Processing designed for the next wave of Integrated Circuits? Be selective, and choose CORIAL’s Atomic Layer Etching and Atomic Layer Deposition technologies (ALE/ALD)! Fourth state of matter Plasma is one of the four states of matter, along with...

Plasma enhanced deposition

Creating a vast array of thin films with PECVD and ICP CVD technologies Fourth state of matter Plasma is one of the four states of matter, along with solids, liquids, and gases. Plasma is an ionized gas consisting of equal numbers of positively-charged ions and...